Tuning Material Properties of ZnO Thin Films for Advanced Sensor Applications

Abstract

We report on the growth of ZnO thin films by plasma-enhanced atomic layer deposition as a function of substrate temperature. The method to ensure self-limiting growth with precise thickness control is discussed and the effect of temperature on the texture of the thin films is presented. Switching the texture from (100) to (002) by increasing the substrate temperature is a key property for functional devices. The ZnO thin films with tailored properties could find applications in a wide range of sensors and actuators.

Keywords

• ZnO
• thin film
• atomic layer deposition
• semiconductor