Comparison of Magnetron-Sputtered and Cathodic Arc-Deposited Ti and Cr Thin Films on Stainless Steel for Bipolar Plates

Abstract

In this work, the potential of magnetron sputtering, as well as cathodic arc evaporation, is investigated with regard to its suitability as a bipolar plate coating of a PEM fuel cell. For this purpose, Cr and Ti thin films were deposited onto a 0.1 mm SS316L by varying the power and bias voltage. The surface structure and thickness of the coatings are examined via SEM and tactile profilometry. Moreover, the coating variants are compared with each other based on the electrical and electrochemical properties relevant to bipolar plates. The sputtered Cr thin films achieve the lowest contact resistance values and exhibit a columnar structure with a smooth surface. Regarding the electrochemical properties, titanium deposited via cathodic arc evaporation has a low current density in the passive region and high breakthrough potential. All in all, both deposition techniques have their individual advantages for the preparation of bipolar plates’ coatings. However, Ti thin films prepared via cathodic arc seem to be the most suitable option due to the combination of a high deposition rate, a low cost and good coating properties.

Keywords

• DC magnetron sputtering
• cathodic arc evaporation
• stainless steel bipolar plates
• corrosion resistance
• interfacial contact resistance