Nature Communications (Oct 2024)

High drain field impact ionization transistors as ideal switches

  • Baowei Yuan,
  • Zhibo Chen,
  • Yingxin Chen,
  • Chengjie Tang,
  • Weiao Chen,
  • Zengguang Cheng,
  • Chunsong Zhao,
  • Zhaozhao Hou,
  • Qiang Zhang,
  • Weizhuo Gan,
  • Jiacheng Gao,
  • Jiale Wang,
  • Jeffrey Xu,
  • Guangxi Hu,
  • Zhenhua Wu,
  • Kun Luo,
  • Mingyan Luo,
  • Yuanbo Zhang,
  • Zengxing Zhang,
  • Shisheng Xiong,
  • Chunxiao Cong,
  • Wenzhong Bao,
  • Shunli Ma,
  • Jing Wan,
  • Peng Zhou,
  • Ye Lu

DOI
https://doi.org/10.1038/s41467-024-53337-8
Journal volume & issue
Vol. 15, no. 1
pp. 1 – 8

Abstract

Read online

Abstract Impact ionization effect has been demonstrated in transistors to enable sub-60 mV dec−1 subthreshold swing. However, traditionally, impact ionization in silicon devices requires a high operation voltage due to limited electrical field near the device drain, contradicting the low energy operation purpose. Here, we report a vertical subthreshold swing device composed of a graphene/silicon heterojunction drain and a silicon channel. This structure creates a low voltage avalanche impact ionization phenomenon and leads to steep switching of the silicon-based device. Experimental measurements reveal a small average subthreshold swing of 16 µV dec−1 over 6 decades of drain current and nearly hysteresis-free, and the operating voltage at which a vertical subthreshold swing occurs can be as low as 0.4 V at room temperature. Furthermore, a complementary silicon-based logic inverter is experimentally demonstrated to reach a voltage gain of 311 at a supply voltage of 2 V.