Nanomaterials (Mar 2019)

Room Temperature Resonant Photocurrent in an Erbium Low-Doped Silicon Transistor at Telecom Wavelength

  • Michele Celebrano,
  • Lavinia Ghirardini,
  • Marco Finazzi,
  • Giorgio Ferrari,
  • Yuki Chiba,
  • Ayman Abdelghafar,
  • Maasa Yano,
  • Takahiro Shinada,
  • Takashi Tanii,
  • Enrico Prati

DOI
https://doi.org/10.3390/nano9030416
Journal volume & issue
Vol. 9, no. 3
p. 416

Abstract

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An erbium-doped silicon transistor prepared by ion implantation and co-doped with oxygen is investigated by photocurrent generation in the telecommunication range. The photocurrent is explored at room temperature as a function of the wavelength by using a supercontinuum laser source working in the μW range. The 1-μm2 transistor is tuned to involve in the transport only those electrons lying in the Er-O states. The spectrally resolved photocurrent is characterized by the typical absorption line of erbium and the linear dependence of the signal over the impinging power demonstrates that the Er-doped transistor is operating far from saturation. The relatively small number of estimated photoexcited atoms (≈ 4 × 10 4 ) makes Er-dpoed silicon potentially suitable for designing resonance-based frequency selective single photon detectors at 1550 nm.

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