AIP Advances (Dec 2016)

n-ZnO/p-GaN heterojunction light-emitting diodes featuring a buried polarization-induced tunneling junction

  • Ling Li,
  • Yuantao Zhang,
  • Long Yan,
  • Junyan Jiang,
  • Xu Han,
  • Gaoqiang Deng,
  • Chen Chi,
  • Junfeng Song

DOI
https://doi.org/10.1063/1.4971272
Journal volume & issue
Vol. 6, no. 12
pp. 125204 – 125204-5

Abstract

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n-ZnO/p-GaN heterojunction light-emitting diodes with a p-GaN/Al0.1Ga0.9N/n+-GaN polarization-induced tunneling junction (PITJ) were fabricated by metal-organic chemical vapor deposition. An intense and sharp ultraviolet emission centered at ∼396 nm was observed under forward bias. Compared with the n-ZnO/p-GaN reference diode without PITJ, the light intensity of the proposed diode is increased by ∼1.4-folds due to the improved current spreading. More importantly, the studied diode operates continuously for eight hours with the decay of only ∼3.5% under 20 mA, suggesting a remarkable operating stability. The results demonstrate the feasibility of using PITJ as hole injection layer for high-performance ZnO-based light-emitting devices.