Dataset on large area nano-crystalline graphite film (NCG) grown on SiO2 using plasma-enhanced chemical vapour deposition
Camelia Albu,
Sandra A.V. Eremia,
Monica Lucia Veca,
Andrei Avram,
Radu Cristian Popa,
Cristina Pachiu,
Cosmin Romanitan,
Mihaela Kusko,
Raluca Gavrila,
Antonio Radoi
Affiliations
Camelia Albu
Centre of Bioanalysis, National Institute of Research and Development for Biological Sciences – Bucharest, 296 Splaiul Independentei, Bucharest, 060031, Romania
Sandra A.V. Eremia
Centre of Bioanalysis, National Institute of Research and Development for Biological Sciences – Bucharest, 296 Splaiul Independentei, Bucharest, 060031, Romania; Corresponding author.
Monica Lucia Veca
National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Andrei Avram
National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Radu Cristian Popa
National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Cristina Pachiu
National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Cosmin Romanitan
National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Mihaela Kusko
National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Raluca Gavrila
National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Antonio Radoi
National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania; Corresponding author.
A Si wafer coated with a low temperature oxide (LTO) was used as substrate (Si/SiO2) during the deposition of a thick nano-crystalline graphite (NCG) film by means of plasma-enhanced chemical vapour deposition (PECVD) procedure. The process parameters, the atomic force (AFM) and scanning electron (SEM) micrographs, Raman spectrum and X-ray diffraction (XRD) pattern are herein illustrated. The as deposited NCG film was electrochemically pretreated (3 mA applied current, during 240 s, in 10 mM phosphate buffer saline (PBS) solution containing 0.1 M KCl, pH 7) and thereafter used as electrode for sensing the caffeic acid content in lyophilised berries and dried chokeberries in “Nano-crystalline graphite film on SiO2: Electrochemistry and electro-analytical application” [1]. Keywords: Plasma-enhanced chemical vapour deposition (PECVD), Nano-crystalline graphite (NCG), Electrochemistry, Caffeic acid
