Measurement + Control (Jan 2023)
Parametric chamfer alignment based on mesh deformation
Abstract
Alignment for natural images in unconstrained environment is a challenging task. Despite the success for complex deformation, existing feature-based methods may be confused in low-textured regions where features are insufficient, while pixel-based approaches may fail when color changes. In this paper, a parametric chamfer alignment method based on mesh warping model is proposed. Warped positions of mesh vertices are considered as parameters and estimated by optimizing an object function, which measures the chamfer distance of edges and the smoothness of warping. To distinguish the sharpness of pixels, edges are detected through K-means cluster and weights are attached to different levels of edge points. In addition, after the warping model is initialized by feature-based alignment, a growing technique for registering the vertices is presented. Experiment shows that the proposed method outperforms some state-of-the-arts on real data and can be applied in stitching ceramic sanitary ware images.