Conversion of Carbon Dioxide into Chemical Vapor Deposited Graphene with Controllable Number of Layers via Hydrogen Plasma Pre-Treatment
Yotsarayuth Seekaew,
Nantikan Tammanoon,
Adisorn Tuantranont,
Tanom Lomas,
Anurat Wisitsoraat,
Chatchawal Wongchoosuk
Affiliations
Yotsarayuth Seekaew
Graphene and Printed Electronics Research Division (GPERD), National Security and Dual-Use Technology Center, National Science and Technology Development Agency, 111 Thailand Science Park, Phahon Yothin Road, Klong Nueng, Klong Luang, Phathum Thani 12120, Thailand
Nantikan Tammanoon
Graphene and Printed Electronics Research Division (GPERD), National Security and Dual-Use Technology Center, National Science and Technology Development Agency, 111 Thailand Science Park, Phahon Yothin Road, Klong Nueng, Klong Luang, Phathum Thani 12120, Thailand
Adisorn Tuantranont
Graphene and Printed Electronics Research Division (GPERD), National Security and Dual-Use Technology Center, National Science and Technology Development Agency, 111 Thailand Science Park, Phahon Yothin Road, Klong Nueng, Klong Luang, Phathum Thani 12120, Thailand
Tanom Lomas
Graphene and Printed Electronics Research Division (GPERD), National Security and Dual-Use Technology Center, National Science and Technology Development Agency, 111 Thailand Science Park, Phahon Yothin Road, Klong Nueng, Klong Luang, Phathum Thani 12120, Thailand
Anurat Wisitsoraat
Graphene and Printed Electronics Research Division (GPERD), National Security and Dual-Use Technology Center, National Science and Technology Development Agency, 111 Thailand Science Park, Phahon Yothin Road, Klong Nueng, Klong Luang, Phathum Thani 12120, Thailand
Chatchawal Wongchoosuk
Department of Physics, Faculty of Science, Kasetsart University, Chatuchak, Bangkok 10900, Thailand
In this work, we report the conversion of carbon dioxide (CO2) gas into graphene on copper foil by using a thermal chemical vapor deposition (CVD) method assisted by hydrogen (H2) plasma pre-treatment. The synthesized graphene has been characterized by Raman spectroscopy, X-ray diffraction, scanning electron microscopy, and transmission electron microscopy. The results show the controllable number of layers (two to six layers) of high-quality graphene by adjusting H2 plasma pre-treatment powers (100–400 W). The number of layers is reduced with increasing H2 plasma pre-treatment powers due to the direct modification of metal catalyst surfaces. Bilayer graphene can be well grown with H2 plasma pre-treatment powers of 400 W while few-layer graphene has been successfully formed under H2 plasma pre-treatment powers ranging from 100 to 300 W. The formation mechanism is highlighted.
