Modifying of etching anisotropy of silicon substrates by surface active agents

• Rola Krzysztof,
• Zubel Irena

Affiliations

Rola Krzysztof

Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland

Zubel Irena

Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland