We have developed circular defects in 2-dimensional photonic crystal lasers that allow current injection for interconnected optical communications. However, when cleaving the sample to measure the output light, the output light intensity changes due to the cleaving position. In a previous study, we proposed a new end face structure called a convex edge structure. In this paper, we design the electron beam lithography patterns to fabricate this structure. With this design, it is possible to eliminate the effect of different cleaving positions and ensure that the cleavage tolerance is larger than the cleavage position error. We also develop the fabrication technology for this structure, fabricate samples, and measure the output light experimentally. The optical properties of the fabricated sample are similar to well-fabricated samples with normal cleavage edge faces. We are assured that these results contribute to future work such as accurate manufacturing and improving the end face configuration to obtain higher outputs.
