In Situ Study of Molecular Doping of Chlorine on MoS2 Field Effect Transistor Device in Ultrahigh Vacuum Conditions

• Nguyen Tat Trung,
• Mohammad Ikram Hossain,
• Md Iftekharul Alam,
• Atsushi Ando,
• Osamu Kitakami,
• Nobuaki Kikuchi,
• Tsuyoshi Takaoka,
• Yasuyuki Sainoo,
• Ryuichi Arafune,
• Tadahiro Komeda

Affiliations

Nguyen Tat Trung

Department of Chemistry, Graduate School of Science, Tohoku University, Sendai, Japan

Mohammad Ikram Hossain

Department of Chemistry, Graduate School of Science, Tohoku University, Sendai, Japan

Md Iftekharul Alam

Department of Chemistry, Graduate School of Science, Tohoku University, Sendai, Japan

Atsushi Ando

Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki, Japan

Osamu Kitakami

Institute of Multidisciplinary Research for Advanced Materials (IMRAM, Tagen), Tohoku University, Sendai, Japan

Nobuaki Kikuchi

Institute of Multidisciplinary Research for Advanced Materials (IMRAM, Tagen), Tohoku University, Sendai, Japan

Tsuyoshi Takaoka

Institute of Multidisciplinary Research for Advanced Materials (IMRAM, Tagen), Tohoku University, Sendai, Japan

Yasuyuki Sainoo

Institute of Multidisciplinary Research for Advanced Materials (IMRAM, Tagen), Tohoku University, Sendai, Japan

Ryuichi Arafune

International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science (NIMS), Tsukuba, Ibaraki, Japan

Tadahiro Komeda

Institute of Multidisciplinary Research for Advanced Materials (IMRAM, Tagen), Tohoku University, Sendai, Japan