Photo-Curing Chitosan-g-N-Methylolacrylamide Compositions: Synthesis and Characterization

Abstract

Chitosan is one of the promising compounds for use in various fields of medicine. However, for successful application, materials based on it must be insoluble in water and have specified physical and mechanical properties. In this work, we studied the interaction of N-methylolacrylamide (NMA) and chitosan upon concentration of the solutions, both under the action of UV radiation and without it, which results in curing of the polymer matrix. The main products, proposed mechanisms of the crosslinking reaction, and the influence of external conditions on these processes have been revealed using NMR, IR, and UV spectroscopy. It was found that the reaction proceeds along three pathways. The main reactions proceed with the amino groups of chitosan, and the hydroxymethyl and vinyl groups of NMA. Studies have shown that for the formation of insoluble materials based on chitosan, the best content in the initial cast solution is 2 wt% of chitosan at 0.25 wt% concentration of NMA. Films formed from such solutions possessed high strength and deformation characteristics, namely an elastic modulus of about 1500 GPa, a strength of about 30 MPa, and an elongation at break of about 100%.

Keywords

• chitosan
• <i>N</i>-methylolacrylamide
• films
• UV irradiation
• reaction mechanism
• strength and deformation characteristics