Diffusion Processes And Interface Electron Scattering In Film Systems Based On Cu/Fe AND Fe/Cr

Abstract

Investigation results of diffusion processes by the SIMS and the AES methods in Cu/Fe and Fe/Cr film systems are represented; influence of the annealing temperature on the effective thermal diffusion coefficients is studied. Values of the interface transmission coefficient and the effective diffusion coefficients in different processes, namely, the condensation-stimulate diffusion, the ion-stimulate one, and the thermal diffusion, are calculated.

Keywords

• Diffusion Profile
• Sims
• Diffusion Coefficient
• Interface Roughness
• Interface Transmission Coefficient