The Effect of Ne<sup>+</sup> Ion Implantation on the Crystal, Magnetic, and Domain Structures of Yttrium Iron Garnet Films
Igor Fodchuk,
Andrij Kotsyubynsky,
Andrii Velychkovych,
Ivan Hutsuliak,
Volodymyra Boychuk,
Volodymyr Kotsyubynsky,
Liubomyr Ropyak
Affiliations
Igor Fodchuk
Department of Solid State Physics, Yuriy Fedkovych Chernivtsi National University, 2 Kotsiubynsky Str., 58012 Chernivtsi, Ukraine
Andrij Kotsyubynsky
Department of Material Science, Vasyl StefanykPrecarpathian National University, 57 Shevchenko Str., 76018 Ivano-Frankivsk, Ukraine
Andrii Velychkovych
Department of Construction and Civil Engineering, Ivano-Frankivsk National Technical University of Oil and Gas, 15 Karpatska Str., 76019 Ivano-Frankivsk, Ukraine
Ivan Hutsuliak
Department of Solid State Physics, Yuriy Fedkovych Chernivtsi National University, 2 Kotsiubynsky Str., 58012 Chernivtsi, Ukraine
Volodymyra Boychuk
Department of Physics, Vasyl StefanykPrecarpathian National University, 57 Shevchenko Str., 76018 Ivano-Frankivsk, Ukraine
Volodymyr Kotsyubynsky
Department of Material Science, Vasyl StefanykPrecarpathian National University, 57 Shevchenko Str., 76018 Ivano-Frankivsk, Ukraine
Liubomyr Ropyak
Department of Computerized Engineering, Ivano-Frankivsk National Technical University of Oil and Gas, 15 Karpatska St., 76019 Ivano-Frankivsk, Ukraine
The mechanism of the influence of crystal inhomogeneities on the magnetic and domain microstructures of functional materials based on yttrium iron garnet heterostructures is an important subject of investigation due to the aim to predict parameters for manufacturingpurposes. A study of the structural and magnetic characteristics of a set of yttrium iron garnet films grown on gadolinium–gallium garnet substrate is presented. High-resolution X-ray diffractometry, Mössbauer spectroscopy, MFM, as well as ion implantation simulation and X-ray diffraction simulation were used together to determine the features of the effect of Ne+ ion implantation with different dose rates on the samples. The simulation of ion implantation with E = 82 keV showed energy loss profiles of Ne ions with subsequent defect formation up to amorphization of near-surface layers at high doses. Implantation creates two magnetically non-equivalent types of tetrahedrally located Fe3+ ions, which leads to a rotation of the total magnetic moment relative to the film surface and a change in the width of the magnetic domain stripes.
