Active and Passive Electronic Components (Jan 1991)

Influence of Thermal Treatment on The Electronic Properties of ITO Thin Films Obtained by RF Cathodic Pulverization. Study of Solar Cells Based on Silicon/(RF Sputtered) ITO Junctions

  • G. Campet,
  • C. Geoffroy,
  • S. J. Wen,
  • J. Portier,
  • P. Keou,
  • J. Salardenne,
  • Z. W. Sun

DOI
https://doi.org/10.1155/1991/47924
Journal volume & issue
Vol. 14, no. 3
pp. 151 – 161

Abstract

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ITO (Indium Tin Oxide) thin films obtained by R.F cathodic sputtering have been studied. The influence of thermal treatment on the electronic properties of the films has been particularly investigated. Electrical measurements were performed between 95 and 600 K. Free carriers concentration in the film were measured by Hall effect coefficient. Optical indices were determined by computer drawing of charts allowing to simplify Manifacier method.