Effect of Femtosecond Laser Polarization on the Damage Threshold of Ta₂O₅/SiO₂ Film

Abstract

The study used linearly and circularly polarized femtosecond pulsed lasers to irradiate a Ta2O5/SiO2 film. Firstly, the damage thresholds of the film for linearly and circularly polarized femtosecond pulsed lasers were measured in 1-on-1 mode. The results showed that the damage threshold (1.70 J/cm2) under a circularly polarized laser was higher than that (1.68 J/cm2) under a linearly polarized laser. For femtosecond lasers, the multi-photon ionization cross-section under circular polarization was lower than that under linear polarization. The lower ionization rate under circular polarization led to a higher damage threshold compared to the case under linear polarization. Secondly, the damage morphology of the film irradiated by linearly and circularly polarized femtosecond lasers was observed by microscope. The damage caused by linearly polarized laser was more evident than that caused by the circularly polarized laser. Finally, the damage thresholds induced by linearly and circularly polarized femtosecond pulsed lasers were measured in S-on-1 (S = 2, 5, and 10) mode. For the same S value (2, 5, or 10), the damage threshold under the circularly polarized laser was higher than that under the linearly polarized laser. The damage thresholds under two polarized laser pulses decreased with an increase in the number of laser shots, indicating that repeated laser pulses had a cumulative effect on the damage of the film.

Keywords

• femtosecond laser
• optical thin film
• damage threshold
• damage morphology
• multi-photon ionization cross-section
• cumulative effect