APL Materials (Aug 2022)

Solid-phase epitaxy of a CuAlO2 template on c-Al2O3 for delafossite growth

  • Amanda Huon,
  • Jong Mok Ok,
  • Sangmoon Yoon,
  • Andrew R. Lupini,
  • Ho Nyung Lee

DOI
https://doi.org/10.1063/5.0103918
Journal volume & issue
Vol. 10, no. 8
pp. 081111 – 081111-5

Abstract

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Thin-film growth of ABO2 delafossites has recently attracted significant attention due to its attractive transport properties and potential applications. A fundamental requirement for achieving high-quality thin films is the availability of lattice matching substrates and chemical compatibility. However, there are still many obstacles to achieving high-quality thin films. Here, we report a process to further engineer a template ABO2 delafossite structure by solid-phase epitaxy of CuAlO2 on the surface of a commercial sapphire substrate, which offers a promising route to growing high-quality epitaxial thin films. The starting reagents involve a layer of polycrystalline Cu2O deposited on a c-Al2O3 substrate by pulsed laser deposition (PLD). Subsequent thermal treatment activates a solid-state interface reaction between the film and substrate, producing a CuAlO2 thin film. The reaction temperature and dwell time parameters were optimized in this study to prepare a phase diagram for CuAlO2 samples without phase impurities. This method provides an essential stepping-stone toward the approachability of a lattice matching template (i.e., substrate-buffer layer) for ABO2 heterostructures. An example of successful epitaxial growth of highly conducting PdCrO2 is also demonstrated by using a CuAlO2 buffer layer.