A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition

Abstract

A new route to deposit alumina nanometric thin films on powders from the single source Aluminum Tri-Isopropoxide (ATI) precursor is developed using the Fluidized Bed Chemical Vapor Deposition (FBCVD) process. For this study, an easy-to-fluidize silica powder is used, as a first step to ultimately coat cohesive oxygen sensitive powders. The FBCVD process has been studied under mild temperature conditions (400–500 °C), without any containing oxygen co-reactant. The influence of the deposition parameters (temperature, total flow rate, precursor inlet molar fraction) on the process behavior (ATI vaporization rate, fluidized bed thermal profile, deposition yield) and on the coating characteristics (composition, thickness, morphology) is analysed in details. Results show that for all conditions tested, the fluidization is maintained and the bed remains almost isothermal all along the deposition experiments, allowing for a uniform coating of the whole particles of the bed. Continuous and conformal nanometric films are obtained, mainly formed of non-carbon contaminated alumina, containing however a small amount of hydroxyl bonds that could be due to air contamination. The proof of concept of using FBCVD from ATI to produce nanometric stoichiometric alumina coatings on powders is then demonstrated, opening the way for new applications.

Keywords

• Chemical vapor deposition
• Fluidized bed
• Alumina thin films
• Silica powder
• Nanometric layers