eLife (Apr 2020)

Enhancer architecture sensitizes cell specific responses to Notch gene dose via a bind and discard mechanism

  • Yi Kuang,
  • Ohad Golan,
  • Kristina Preusse,
  • Brittany Cain,
  • Collin J Christensen,
  • Joseph Salomone,
  • Ian Campbell,
  • FearGod V Okwubido-Williams,
  • Matthew R Hass,
  • Zhenyu Yuan,
  • Nathanel Eafergan,
  • Kenneth H Moberg,
  • Rhett A Kovall,
  • Raphael Kopan,
  • David Sprinzak,
  • Brian Gebelein

DOI
https://doi.org/10.7554/eLife.53659
Journal volume & issue
Vol. 9

Abstract

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Notch pathway haploinsufficiency can cause severe developmental syndromes with highly variable penetrance. Currently, we have a limited mechanistic understanding of phenotype variability due to gene dosage. Here, we unexpectedly found that inserting an enhancer containing pioneer transcription factor sites coupled to Notch dimer sites can induce a subset of Notch haploinsufficiency phenotypes in Drosophila with wild type Notch gene dose. Using Drosophila genetics, we show that this enhancer induces Notch phenotypes in a Cdk8-dependent, transcription-independent manner. We further combined mathematical modeling with quantitative trait and expression analysis to build a model that describes how changes in Notch signal production versus degradation differentially impact cellular outcomes that require long versus short signal duration. Altogether, these findings support a ‘bind and discard’ mechanism in which enhancers with specific binding sites promote rapid Cdk8-dependent Notch turnover, and thereby reduce Notch-dependent transcription at other loci and sensitize tissues to gene dose based upon signal duration.

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