npj 2D Materials and Applications (May 2021)

Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors

  • Hae Won Cho,
  • Pavan Pujar,
  • Minsu Choi,
  • Seunghun Kang,
  • Seongin Hong,
  • Junwoo Park,
  • Seungho Baek,
  • Yunseok Kim,
  • Jaichan Lee,
  • Sunkook Kim

DOI
https://doi.org/10.1038/s41699-021-00240-1
Journal volume & issue
Vol. 5, no. 1
pp. 1 – 1

Abstract

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