SPECTROSCOPY STUDY OF PLASMAS IN PAPVD AND PACVD PROCESSES USING NITROGEN AS FILLED GAS IN THE COATINGS PRODUCTION

Abstract

In this work a study of plasma characteristics used in the production of polymeric coatings by PACVD techniques (Plasma Assisted Chemical Vapor Deposition) using Glow Discharge, and TiN coatings produced by means of PAPVD (Plasma Assisted Physical Vapor Deposition) using a pulsed arc discharge was carried out. In the both cases nitrogen as filled gas was used. Moreover, different reactions occurring during the process employing optical emission spectroscopy (OES) are observed. In the case of the Glow discharge, most of the nitrogen is found in molecular form, while in the arc discharge, nitrogen is dissociated almost completely due to the molecular spectrum around of 350 nm was not found, and only very small bands in other regions of the spectrum were observed. Moreover, there are many excited and ionized emission lines of atomic nitrogen. These chemical reaction characteristics make the coatings on the surface were produced in different ways for the two cases.

Keywords

• OES
• PACVD
• PAPVD
• plasma
• Polímeros
• Recubrimientos
• TiN.