Growth, Single-Crystalline Rutile TiO2 Nanorod Thin Film By Hydrothermal Technique

Abstract

A facile, hydrothermal technique was developed to growth, single-crystalline rutile TiO2 nanorod thin films on transparent conductive fluorine-doped tin oxide (FTO) substrates. In this study, the deferent periods(6, 9, 12, 15, and 18 hour) were selective with constant temperature at 160 oC to growth this films and growth in deferent temperature (130, 150,170,190, and 210 oC) with constant period of deposition at 6h. SEM image showed all the films were nanorodand the EDX measurement was given the portion of element that contribution in rutile TiO2 nanorod thin films. The diameter, length, and density of the nanorods could be varied by changingthe growth parameters. The XRD to determine the structure properties, and optical properties were measured of these rutile TiO2 nanorod thin films and obtained the absorbance and energy gap.

Keywords

• Hydrothermal technique
• growth single-crystalline
• rutile TiO2 nanorod
• thin films