Dual Laser Beam Processing of Semiconducting Thin Films by Excited State Absorption

Abstract

We present a unique dual laser beam processing approach based on excited state absorption by structuring 200 nm thin zinc oxide films sputtered on fused silica substrates. The combination of two pulsed nanosecond-laser beams with different photon energies—one below and one above the zinc oxide band gap energy—allows for a precise, efficient, and homogeneous ablation of the films without substrate damage. Based on structuring experiments in dependence on laser wavelength, pulse fluence, and pulse delay of both laser beams, a detailed concept of energy transfer and excitation processes during irradiation was developed. It provides a comprehensive understanding of the thermal and electronic processes during ablation. To quantify the efficiency improvements of the dual-beam process compared to single-beam ablation, a simple efficiency model was developed.

Keywords

• dual laser beam processing
• excited state absorption
• semiconducting thin films
• multi-beam micromachining
• nanosecond laser
• stimulated emission depletion