Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching

• Hee-Jung Yeom,
• Min Young Yoon,
• Daehan Choi,
• Youngseok Lee,
• Jung-Hyung Kim,
• Shin-Jae You,
• Hyo-Chang Lee

Affiliations

Hee-Jung Yeom

Korea Research Institute of Standards and Science, Daejeon, Republic of Korea

Min Young Yoon

Korea Research Institute of Standards and Science, Daejeon, Republic of Korea

Daehan Choi

Korea Research Institute of Standards and Science, Daejeon, Republic of Korea

Youngseok Lee

Institute of Quantum System (IQS), Chungnam National University, Daejeon, Republic of Korea

Jung-Hyung Kim

Korea Research Institute of Standards and Science, Daejeon, Republic of Korea

Shin-Jae You

Department of Physics, Chungnam National University, Daejeon, Republic of Korea

Hyo-Chang Lee

School of Electronics and Information Engineering, Korea Aerospace University, Goyang, Republic of Korea