Sensors (Jan 2021)

EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

  • Ombeline de La Rochefoucauld,
  • Guillaume Dovillaire,
  • Fabrice Harms,
  • Mourad Idir,
  • Lei Huang,
  • Xavier Levecq,
  • Martin Piponnier,
  • Philippe Zeitoun

DOI
https://doi.org/10.3390/s21030874
Journal volume & issue
Vol. 21, no. 3
p. 874

Abstract

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For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.

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