Transmitted electron exposure in electron beam lithography for double-side patterning of bi-layer metasurfaces on a SiNx membrane

Jinyu Guo; Yifei Wang; Hao Quan; Shuoqiu Tian; Qiucheng Chen; Wentao Yuan; Qingxin Wu; Kangping Liu; Yifang Chen; Qiong He; Lei Zhou

doi:10.1016/j.mne.2025.100313

Micro and Nano Engineering (Sep 2025)

Transmitted electron exposure in electron beam lithography for double-side patterning of bi-layer metasurfaces on a SiNx membrane

Jinyu Guo,
Yifei Wang,
Hao Quan,
Shuoqiu Tian,
Qiucheng Chen,
Wentao Yuan,
Qingxin Wu,
Kangping Liu,
Yifang Chen,
Qiong He,
Lei Zhou

Affiliations

Jinyu Guo: Nanolithography and Application Research Group, School of Information Science and Technology, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China
Yifei Wang: State Key Laboratory of Surface Physics, Key Laboratory of Micro and Nano Photonic Structures (MOE), and Department of Physics, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China
Hao Quan: Nanolithography and Application Research Group, School of Information Science and Technology, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China
Shuoqiu Tian: Nanolithography and Application Research Group, School of Information Science and Technology, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China
Qiucheng Chen: Nanolithography and Application Research Group, School of Information Science and Technology, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China
Wentao Yuan: Nanolithography and Application Research Group, School of Information Science and Technology, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China
Qingxin Wu: Nanolithography and Application Research Group, School of Information Science and Technology, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China
Kangping Liu: Nanolithography and Application Research Group, School of Information Science and Technology, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China
Yifang Chen: Nanolithography and Application Research Group, School of Information Science and Technology, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China; Corresponding author at: Nanolithography and Application Research Group, School of Information Science and Technology, Fudan University, Shanghai 200433, China. State Key Laboratory of Surface Physics, Key Laboratory of Micro and Nano Photonic Structures (MOE), and Department of Physics, Fudan University, Shanghai 200433, China.
Qiong He: State Key Laboratory of Surface Physics, Key Laboratory of Micro and Nano Photonic Structures (MOE), and Department of Physics, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China; Corresponding authors at: State Key Laboratory of Surface Physics, Key Laboratory of Micro and Nano Photonic Structures (MOE), and Department of Physics, Fudan University, Shanghai 200433, China. Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China.
Lei Zhou: State Key Laboratory of Surface Physics, Key Laboratory of Micro and Nano Photonic Structures (MOE), and Department of Physics, Fudan University, Shanghai 200433, China; Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China; Corresponding authors at: State Key Laboratory of Surface Physics, Key Laboratory of Micro and Nano Photonic Structures (MOE), and Department of Physics, Fudan University, Shanghai 200433, China. Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Fudan University, Shanghai 200433, China.

DOI: https://doi.org/10.1016/j.mne.2025.100313
Journal volume & issue: Vol. 28
p. 100313

Abstract

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Metasheets, composed of two identical metasurfaces closely aligned to each other within a mode-coupling distance on the two opposite sides of a SiNx membrane, are of unique functionalities for effective modulation of electromagnetic waves by nanoscale metallic structures. Although the physical image is readily clear, nanofabrication of such a two-sided devices with identical patterns still remains a big challenge because of the e-beam spreading caused by forward scattering in both resists and membranes. In this work, an innovative transmitted electron beam lithography (TEBL) was developed for metasheets. Three different resist stacks were tried and compared to eliminate the pattern deviation between them. A simulation study of TEBL was systematically carried out to figure out a reliable process window for replicating identical Au-gratings on the two opposite sides. The principle behind the success of replicating two identical metasurfaces on opposite sides is analyzed. The developed TEBL in this work extends the application of electron beam lithography to double-sided patterning for novel optical devices such as metasheets.

Published in Micro and Nano Engineering

ISSN: 2590-0072 (Online)
Publisher: Elsevier
Country of publisher: Netherlands
LCC subjects: Technology: Electrical engineering. Electronics. Nuclear engineering: Electronics; Technology: Technology (General)
Website: https://www.journals.elsevier.com/micro-and-nano-engineering

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