Generation of Large-area Arrays of Aperiodic Functional Micro/nano Structures Using Phase Shift Interferometry

Abstract

Phase shift interferometry (PSI) derived from interference technique as greater surface characterization technique based on the interference information recorded during a controlled phase shift. This research shows the development of micro/nano structures using phase shift interferometry. (PSI) is the process of developing the complex pattern structure using variable phase angle between two or more beams aligned to obtain functional aperiodic arrays. We have designed and modelled the PSI and simulated through MATLAB in 2D and 3D pattern structures. The PSI was performed in two process analysis. First, without PSI referring normal interference technique. Second, with PSI referring position of laser beams in quadrant-based alignment. The obtained results show the minimum feature structure was measured as 12 nm. This feature size developed under phase shift interferometry (PSI) produces minimum feature size compared to the existing interferometry technique. This study gives the promising increased fabrication area could develop large area arrays structures.

Keywords

• laser interference lithography (lil)
• pattern structures
• periodic and aperiodic pattern
• phase shift interferometry (psi)