Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO<sub>2</sub> Thin Films and Their Insulator–Metal Transition Behavior. <i>Materials</i> 2019, <i>12</i>, 2160
Chunzi Zhang,
Ozan Gunes,
Yuanshi Li,
Xiaoyu Cui,
Masoud Mohammadtaheri,
Shi-Jie Wen,
Rick Wong,
Qiaoqin Yang,
Safa Kasap
Affiliations
Chunzi Zhang
Department of Electrical and Computer Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada
Ozan Gunes
Department of Electrical and Computer Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada
Yuanshi Li
Department of Mechanical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada
Xiaoyu Cui
Canadian Light Source Inc., 44 Innovation Boulevard, Saskatoon, SK S7N 2V3, Canada
Masoud Mohammadtaheri
Department of Mechanical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada
Shi-Jie Wen
Cisco Systems Inc., San Jose, CA 95134, USA
Rick Wong
Cisco Systems Inc., San Jose, CA 95134, USA
Qiaoqin Yang
Department of Mechanical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada
Safa Kasap
Department of Electrical and Computer Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada
