Scientific Reports (May 2017)

Large spin Hall angle in vanadium film

  • T. Wang,
  • W. Wang,
  • Y. Xie,
  • M. A. Warsi,
  • J. Wu,
  • Y. Chen,
  • V. O. Lorenz,
  • X. Fan,
  • J. Q. Xiao

DOI
https://doi.org/10.1038/s41598-017-01112-9
Journal volume & issue
Vol. 7, no. 1
pp. 1 – 6

Abstract

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Abstract We report a large spin Hall angle observed in vanadium films sputter-grown at room temperature, which have small grain size and consist of a mixture of body centered tetragonal (bct) and body centered cubic (bcc) structures. The spin Hall angle is as large as θ V = −0.071 ± 0.003, comparable to that of platinum, θ Pt = 0.076 ± 0.007, and is much larger than that of bcc V film grown at 400 °C, θ V_bcc = −0.012 ± 0.002. Similar to β-tantalum and β-tungsten, the sputter-grown V films also have a high resistivity of more than 200 μΩ∙cm. Surprisingly, the spin diffusion length is still long at 16.3 nm. This finding not only indicates that specific crystalline structure can lead to a large spin Hall effect but also suggests 3d light metals should not be ruled out in the search for materials with large spin Hall angle.