Spatial Atomic Layer Deposition for Energy and Electronic Devices

Abstract

Functional thin films play a critical role in efforts toward efficient devices for energy conversion and storage, as well as low-loss electronics. These films need to be manufactured at scale, cost-effectively, and with precision. Atmospheric pressure spatial atomic layer deposition (AP-SALD) has emerged as a promising technique for fulfilling these requirements. AP-SALD replicates the subnanometer control of thickness, uniformity, crystallinity, and conformality to the substrate featured in conventional atomic-layer-deposited films, but has the important advantage of depositing these films with growth rates that are orders of magnitude higher. This review discusses the opportunities and advantages that AP-SALD opens up in energy-conversion and storage devices, as well as low-loss electronics. In particular, the review features recent work on using AP-SALD-grown films for photovoltaics, light-emitting diodes, self-powered sensors, and photoelectrochemical cells and batteries, as well as in transparent conductive materials and the epitaxial growth of thin films. Perspectives on future unexplored opportunities for AP-SALD in energy and low-loss electronics are also discussed.