Optical Characterizations of RF-Magnetron Sputtered Nanocrystalline TiO2 Thin Film

Abstract

TiO2 nanocrystalline thin films are widely used as antireflection coatingin solar cell, in this paper, RF magnetron sputtering technique is used to prepareTiO2 thin film on glass substrates, TiO2 thin films deposited under differentpowers (75,100,125 and 150) Watt for (1.5) hour resulted in different layerthickness (62.5,88,118 and 132.6) nm respectively. The optical propertiesexamined by UV-VIS spectroscopy. TiO2 thin films exhibit a high transparency inthe region from about 350 nm above, we suggest that these results indicate themost suitable growing conditions for obtaining high quality sputtered TiO2 thinfilms with higher transparence performance for solar cell application. the opticalabsorbance coefficient for all films were genuinely high esteems coming to above104 cm-1, which implies that there is allowed direct transitions, the energy gabreach to the typical value of the bulk TiO2 (3.5) eV.

Keywords

• titanium dioxide
• thin films
• rf sputtering
• optical properties