2D Dielectric Nanoimprinted PMMA Pillars on Metallo-Dielectric Films

Abstract

In this work, we propose an optimized nanoimprint protocol for the fabrication of a two-dimensional (2D) array of polymethyl-methacrylate (PMMA) nano-pillars deposited on different sputtered configurations (bilayer and multi-layer) of copper (Cu) and aluminum nitride (AlN) slabs supported by a silicon dioxide (SiO2) substrate. Both the Cu/AlN bilayer and multilayer thin films were deposited by a sputtering technique. The sub-micron PMMA pillars were realized by using nanoimprint lithography (NIL). In order to optimize the NIL process, several tests were performed by varying temperature and pressure, allowing us to achieve uniform and high-resolution pillars. The fabricated periodic array enabled the phase-matching of the incident plane wave exciting optical resonances. All the fabricated devices were then optically characterized by means of an ad hoc setup, where the reflected light from the sample was analyzed. The fabricated nano-pillars are mechanically stable, and they could be fully exploited for the realization of novel metallo-dielectric core/shell structures for sensing, surface-enhanced Raman spectroscopy, and light−matter interactions.

Keywords

• NIL
• thin films deposition
• optical absorbers
• diffraction grating
• guided-mode resonance