Nanophotonics (Aug 2022)
Direct growth of monolayer MoS2 on nanostructured silicon waveguides
- Kuppadakkath Athira,
- Najafidehaghani Emad,
- Gan Ziyang,
- Tuniz Alessandro,
- Ngo Gia Quyet,
- Knopf Heiko,
- Löchner Franz J. F.,
- Abtahi Fatemeh,
- Bucher Tobias,
- Shradha Sai,
- Käsebier Thomas,
- Palomba Stefano,
- Felde Nadja,
- Paul Pallabi,
- Ullsperger Tobias,
- Schröder Sven,
- Szeghalmi Adriana,
- Pertsch Thomas,
- Staude Isabelle,
- Zeitner Uwe,
- George Antony,
- Turchanin Andrey,
- Eilenberger Falk
Affiliations
- Kuppadakkath Athira
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Najafidehaghani Emad
- Friedrich Schiller University, Institute of Physical Chemistry, Jena, Germany
- Gan Ziyang
- Friedrich Schiller University, Institute of Physical Chemistry, Jena, Germany
- Tuniz Alessandro
- Fraunhofer-Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany
- Ngo Gia Quyet
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Knopf Heiko
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Löchner Franz J. F.
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Abtahi Fatemeh
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Bucher Tobias
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Shradha Sai
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Käsebier Thomas
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Palomba Stefano
- Fraunhofer-Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany
- Felde Nadja
- Max Planck School of Photonics, Hans-Knöll-Straße 1, 07745Jena, Germany
- Paul Pallabi
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Ullsperger Tobias
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Schröder Sven
- Max Planck School of Photonics, Hans-Knöll-Straße 1, 07745Jena, Germany
- Szeghalmi Adriana
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Pertsch Thomas
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Staude Isabelle
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- Zeitner Uwe
- Max Planck School of Photonics, Hans-Knöll-Straße 1, 07745Jena, Germany
- George Antony
- Friedrich Schiller University, Institute of Physical Chemistry, Jena, Germany
- Turchanin Andrey
- Friedrich Schiller University, Institute of Physical Chemistry, Jena, Germany
- Eilenberger Falk
- Friedrich Schiller University, Institute of Applied Physics, Abbe Center of Photonics, Albert-Einstein-Str. 15, 07745Jena, Germany
- DOI
- https://doi.org/10.1515/nanoph-2022-0235
- Journal volume & issue
-
Vol. 11,
no. 19
pp. 4397 – 4408
Abstract
We report for the first time the direct growth of molybdenum disulfide (MoS2) monolayers on nanostructured silicon-on-insulator waveguides. Our results indicate the possibility of utilizing the Chemical Vapour Deposition (CVD) on nanostructured photonic devices in a scalable process. Direct growth of 2D material on nanostructures rectifies many drawbacks of the transfer-based approaches. We show that the van der Waals material grow conformally across the curves, edges, and the silicon–SiO2 interface of the waveguide structure. Here, the waveguide structure used as a growth substrate is complex not just in terms of its geometry but also due to the two materials (Si and SiO2) involved. A transfer-free method like this yields a novel approach for functionalizing nanostructured, integrated optical architectures with an optically active direct semiconductor.
Keywords
