Nanophotonics (Aug 2022)

Direct growth of monolayer MoS2 on nanostructured silicon waveguides

  • Kuppadakkath Athira,
  • Najafidehaghani Emad,
  • Gan Ziyang,
  • Tuniz Alessandro,
  • Ngo Gia Quyet,
  • Knopf Heiko,
  • Löchner Franz J. F.,
  • Abtahi Fatemeh,
  • Bucher Tobias,
  • Shradha Sai,
  • Käsebier Thomas,
  • Palomba Stefano,
  • Felde Nadja,
  • Paul Pallabi,
  • Ullsperger Tobias,
  • Schröder Sven,
  • Szeghalmi Adriana,
  • Pertsch Thomas,
  • Staude Isabelle,
  • Zeitner Uwe,
  • George Antony,
  • Turchanin Andrey,
  • Eilenberger Falk

Journal volume & issue
Vol. 11, no. 19
pp. 4397 – 4408


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We report for the first time the direct growth of molybdenum disulfide (MoS2) monolayers on nanostructured silicon-on-insulator waveguides. Our results indicate the possibility of utilizing the Chemical Vapour Deposition (CVD) on nanostructured photonic devices in a scalable process. Direct growth of 2D material on nanostructures rectifies many drawbacks of the transfer-based approaches. We show that the van der Waals material grow conformally across the curves, edges, and the silicon–SiO2 interface of the waveguide structure. Here, the waveguide structure used as a growth substrate is complex not just in terms of its geometry but also due to the two materials (Si and SiO2) involved. A transfer-free method like this yields a novel approach for functionalizing nanostructured, integrated optical architectures with an optically active direct semiconductor.