UV-induced catalyst-free intramolecular formal Heck reaction

Wangsheng Liu; Dongmei Ma; Hao Guo; Guangxin Gu

Journal of Saudi Chemical Society (Sep 2019)

UV-induced catalyst-free intramolecular formal Heck reaction

Wangsheng Liu,
Dongmei Ma,
Hao Guo,
Guangxin Gu

Affiliations

Wangsheng Liu: Department of Chemistry, Fudan University, 2005 Songhu Road, Shanghai 200438, PR China
Dongmei Ma: Department of Chemistry, Fudan University, 2005 Songhu Road, Shanghai 200438, PR China
Hao Guo: Department of Chemistry, Fudan University, 2005 Songhu Road, Shanghai 200438, PR China; Academy for Engineering and Technology, Fudan University, 220 Handan Road, Shanghai 200433, PR China; Corresponding authors.
Guangxin Gu: Department of Materials Science, Fudan University, 220 Handan Road, Shanghai 200433, PR China; Academy for Engineering and Technology, Fudan University, 220 Handan Road, Shanghai 200433, PR China; Corresponding authors.

Journal volume & issue: Vol. 23, no. 6
pp. 718 – 724

Abstract

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A catalyst-free intramolecular formal Heck reaction has been developed, affording 9-benzylidene-9H-fluorene derivatives under UV irradiation. This reaction probably proceeds via UV-induced homolytic cleavage of CI bond, addition of the aryl radical to the alkene moiety, single electron oxidation of alkyl radical intermediate into carbocation species, and deprotonation. Keywords: Photochemistry, Cyclization, Radical, Fluorene

Published in Journal of Saudi Chemical Society

ISSN: 1319-6103 (Print)
Publisher: Elsevier
Country of publisher: Saudi Arabia
LCC subjects: Science: Chemistry
Website: https://link.springer.com/journal/44442

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