International Journal of Photoenergy (Jan 2014)

Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application

  • Seigo Ito,
  • Noriyuki Kitagawa,
  • Takahiro Shibahara,
  • Hitoshi Nishino

DOI
https://doi.org/10.1155/2014/943538
Journal volume & issue
Vol. 2014

Abstract

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Te and Se layers were deposited on 〈glass/FTO/flat-TiO2〉 by electrochemical deposition. The Te-Se-stacked layer was annealed at 200°C, and then, the migration of Te into the Se layer by annealing was confirmed using auger electron spectroscopy (AES), which was performed by Te doping on the Se layer. Au back contact was coated by vacuum deposition on the Te-doped Se layer, resulting in superstrate-structured solar cells of 〈glass/FTO/flat-TiO2/Se-doped Te/Au〉 with a 0.50 V open-circuit voltage, 6.4 mA/cm2 photocurrent density, 0.36 fill factor, and 1.17% conversion efficiency.