One-Step Reduction of Graphene Oxide with Phosphorus/Silicon-Containing Compound and Its Flame Retardancy in Epoxy Resin

Abstract

A novel graphene-based phosphorus/silicon-containing flame retardant (GO-DOPO-V) was obtained via one-step reduction of graphene oxide (GO) with phosphorus/silicon-containing compound (DOPO-V). The Fourier transform infrared (FTIR) spectroscopy, X-ray photoelectron spectrometer (XPS), Atomic force microscope (AFM) and Thermogravimetric analysis (TGA) measurements were used to confirm the structure and morphology. After incorporation of 2 wt% GO-DOPO-V, the maximum decreases of 28.8% in peak heat release rate and 15.6% in total heat release are achieved compared to that of pure epoxy resin (EP). Furthermore, TGA and Scanning electron microscopy (SEM) measurement showed that GO-DOPO-V significantly enhanced the thermal stability and residual char strength of EP. Thus, attributed to the barrier effect of GO and phosphorus/silicon layer formation by DOPO-V, GO-DOPO-V was a high-efficient flame retardant to improve the combustion behavior of EP nanocomposite.

Keywords

• graphene oxide
• functionalization
• P/Si flame retardant
• epoxy resin