Sensors (Dec 2017)
A 45 nm Stacked CMOS Image Sensor Process Technology for Submicron Pixel
- Seiji Takahashi,
- Yi-Min Huang,
- Jhy-Jyi Sze,
- Tung-Ting Wu,
- Fu-Sheng Guo,
- Wei-Cheng Hsu,
- Tung-Hsiung Tseng,
- King Liao,
- Chin-Chia Kuo,
- Tzu-Hsiang Chen,
- Wei-Chieh Chiang,
- Chun-Hao Chuang,
- Keng-Yu Chou,
- Chi-Hsien Chung,
- Kuo-Yu Chou,
- Chien-Hsien Tseng,
- Chuan-Joung Wang,
- Dun-Nien Yaung
Affiliations
- Seiji Takahashi
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Yi-Min Huang
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Jhy-Jyi Sze
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Tung-Ting Wu
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Fu-Sheng Guo
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Wei-Cheng Hsu
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Tung-Hsiung Tseng
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- King Liao
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Chin-Chia Kuo
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Tzu-Hsiang Chen
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Wei-Chieh Chiang
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Chun-Hao Chuang
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Keng-Yu Chou
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Chi-Hsien Chung
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Kuo-Yu Chou
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Chien-Hsien Tseng
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Chuan-Joung Wang
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- Dun-Nien Yaung
- Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan
- DOI
- https://doi.org/10.3390/s17122816
- Journal volume & issue
-
Vol. 17,
no. 12
p. 2816
Abstract
A submicron pixel’s light and dark performance were studied by experiment and simulation. An advanced node technology incorporated with a stacked CMOS image sensor (CIS) is promising in that it may enhance performance. In this work, we demonstrated a low dark current of 3.2 e−/s at 60 °C, an ultra-low read noise of 0.90 e−·rms, a high full well capacity (FWC) of 4100 e−, and blooming of 0.5% in 0.9 μm pixels with a pixel supply voltage of 2.8 V. In addition, the simulation study result of 0.8 μm pixels is discussed.
Keywords
- submicron pixel
- image sensor
- stacked CMOS image sensor
- dark current
- read noise
- random telegraph noise
- full well capacity
- optical crosstalk
