Micro-Nano Machining TiO₂ Patterns without Residual Layer by Unconventional Imprinting

Abstract

Usually, the residual layer remains after patterning TiO2 sol. The existence of the TiO2 residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricate a residual-free TiO2 pattern is proposed. The thermoplastic polymer with Ti4+ salt was fast patterned at room temperature by imprinting, based on the different interfacial force. Then, the patterned thermoplastic polymer with Ti4+ salt was induced into the TiO2 lines without residual layer under the hydrothermal condition. This method provides a new idea to pattern metal oxide without residual layer, which is potentially applied to the gas sensor, the optical detector and the light emitting diode.

Keywords

• TiO₂
• PMMA
• residual
• imprinting
• patterns
• arrays