CHIMIA (Oct 2003)

Nano-Structuring by Molecular Self-Assembly

  • Caterina Minelli,
  • Mark Hempenius,
  • Julius Vancso,
  • François Diederich,
  • Derk Joester,
  • Raphaël Pugin,
  • Christian Hinderling,
  • Sylvia Jeney,
  • Martha Liley,
  • Myriam Losson,
  • Nicolas Blondiaux,
  • Harry Heinzelmann

DOI
https://doi.org/10.2533/000942903777678786
Journal volume & issue
Vol. 57, no. 10

Abstract

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In contrast to conventional lithography techniques which will soon hit their limits in terms of feature size and fabrication cost, recent years have seen considerable progress in the development of self-assembling nano-structured surfaces. In the work reported here, surface structures on the submicron scale have been created from polymer, copolymer, nanoparticle, and dendrimer building blocks by employing phenomena such as self-assembly, self-organization and non-equilibrium processes. This low-cost approach is expected to result in a new generation of surfaces with novel physical and chemical properties.

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