Etching of a fluoropolymer coating synthesized by the hot wire chemical vapor deposition method in a low-frequency induction discharge plasma

Abstract

The process of plasma etching for the formation of a biphilic pattern in a continuous homogeneous fluoropolymer coating on a copper substrate is studied. Argon or oxygen plasma of low frequency ferromagnetic amplified induction discharge is used to etch a fluoropolymer coating. Plasma etching was carried out through a mask with parallel slits. The etching rate in argon plasma was 10 nm/min, the etching rate in oxygen plasma was 60 nm/min. Biphilic surfaces were obtained, consisting of fluoropolymer strips on a copper surface. It has been shown that when using both argon plasma and oxygen plasma, it is possible to create biphilic surfaces by etching a continuous homogeneous fluoropolymer coating through a mask. Moreover, oxygen plasma is better suited for this because it has a higher etching rate and weakly changes the wettability of the surface.