Influence of the NiFe/Cu/NiFe Structure Dimensions and Position in External Magnetic Field on Resistance Changes under the Magnetoresistance Effect

Abstract

The subject of this work is NiFe/Cu/NiFe thin-film structures made by magnetron sputtering and showing the phenomenon of magnetoresistance. Three series of samples differing in spatial dimensions and thickness of the Cu spacer were produced. During the sputtering process, an external magnetic field of approx. 10 mT was applied to the substrate. Measurements of the resistance of the structures were carried out in the field of neodymium magnets in three different positions of the sample in relation to the direction of the field. The measurements allowed us to indicate in which position the structures of different series achieved the greatest changes in resistance. For each of the three series of layer systems, the nature of changes in the determined coefficient of giant magnetoresistance ΔR/R remained similar, while for the series with the smallest copper thickness (2.5 nm), the coefficient reached the highest value of about 2.7‰. In addition, impedance measurements were made for the structures of each series in the frequency range from 100 Hz to 100 kHz. For series with a thinner copper layer, a decrease in impedance values was observed in the 10–100 kHz range.

Keywords

• magnetron sputtering
• thin films
• static magnetic field
• giant magnetoresistance