Asymmetric Interfaces in Epitaxial Off-Stoichiometric Fe<sub>3+<i>x</i></sub>Si<sub>1−<i>x</i></sub>/Ge/Fe<sub>3+<i>x</i></sub>Si<sub>1−<i>x</i></sub> Hybrid Structures: Effect on Magnetic and Electric Transport Properties
Anton S. Tarasov,
Ivan A. Tarasov,
Ivan A. Yakovlev,
Mikhail V. Rautskii,
Ilya A. Bondarev,
Anna V. Lukyanenko,
Mikhail S. Platunov,
Mikhail N. Volochaev,
Dmitriy D. Efimov,
Aleksandr Yu. Goikhman,
Boris A. Belyaev,
Filipp A. Baron,
Lev V. Shanidze,
Michael Farle,
Sergey N. Varnakov,
Sergei G. Ovchinnikov,
Nikita V. Volkov
Affiliations
Anton S. Tarasov
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Ivan A. Tarasov
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Ivan A. Yakovlev
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Mikhail V. Rautskii
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Ilya A. Bondarev
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Anna V. Lukyanenko
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Mikhail S. Platunov
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Mikhail N. Volochaev
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Dmitriy D. Efimov
REC Functional Nanomaterials, Immanuel Kant Baltic Federal University, 236016 Kaliningrad, Russia
Aleksandr Yu. Goikhman
REC Functional Nanomaterials, Immanuel Kant Baltic Federal University, 236016 Kaliningrad, Russia
Boris A. Belyaev
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Filipp A. Baron
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Lev V. Shanidze
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Michael Farle
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Sergey N. Varnakov
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Sergei G. Ovchinnikov
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Nikita V. Volkov
Kirensky Institute of Physics, Federal Research Center KSC SB RAS, 660036 Krasnoyarsk, Russia
Three-layer iron-rich Fe3+xSi1−x/Ge/Fe3+xSi1−x (0.2 x 3+xSi1−x heterosystem due to the incorporation of Ge atoms into the Fe3+xSi1−x bottom layer. The resultant lowering of the total free energy caused by the development of the surface roughness results in a transition from an epitaxial to a polycrystalline growth of the upper Fe3+xSi1−x. The average lattice distortion and residual stress of the upper Fe3+xSi1−x were determined by electron diffraction and theoretical calculations to be equivalent to 0.2 GPa for the upper epitaxial layer with a volume misfit of −0.63% compared with a undistorted counterpart. The volume misfit follows the resultant interatomic misfit of |0.42|% with the bottom Ge layer, independently determined by atomic force microscopy. The variation in structural order and morphology significantly changes the magnetic properties of the upper Fe3+xSi1−x layer and leads to a subtle effect on the transport properties of the Ge layer. Both hysteresis loops and FMR spectra differ for the structures with 4 nm and 7 nm Ge layers. The FMR spectra exhibit two distinct absorption lines corresponding to two layers of ferromagnetic Fe3+xSi1−x films. At the same time, a third FMR line appears in the sample with the thicker Ge. The angular dependences of the resonance field of the FMR spectra measured in the plane of the film have a pronounced easy-axis type anisotropy, as well as an anisotropy corresponding to the cubic crystal symmetry of Fe3+xSi1−x, which implies the epitaxial orientation relationship of Fe3+xSi1−x (111)[0−11] || Ge(111)[1−10] || Fe3+xSi1−x (111)[0−11] || Si(111)[1−10]. Calculated from ferromagnetic resonance (FMR) data saturation magnetization exceeds 1000 kA/m. The temperature dependence of the electrical resistivity of a Ge layer with thicknesses of 4 nm and 7 nm is of semiconducting type, which is, however, determined by different transport mechanisms.