Tekhnologiya i Konstruirovanie v Elektronnoi Apparature (Oct 2009)
Study of thin-film resistor resistance error
Abstract
A relationship between a thin-film resistor resistance error and mask misalignment with a substrate conductive layer at the second photolithography stage for a thin-film resistor design in which the resistive element does not overlap conductor pads is studied. The error value is at a maximum when the resistor aspect ratio is equal to 1.0.
