Design and realization of high-resolution optoelectronic imaging system

Abstract

Aiming at the demand for a large field of view, extreme temperature difference, and high resolution in various fields, as well as the problems of poor real-time and low portability of traditional photoelectric imaging systems. A distributed photoelectric imaging system based on FPGA is designed and implemented in this paper. The entire system comprises an optical system, a photoelectric imaging system, and a computer communication system. The optical imaging lens incorporates an atomic filter for filtering, and the imaging detector enables real-time, high signal-to-noise ratio, high resolution, and large field-of-view imaging in the upper computer. The image processing module of the system utilizes the feature information of the image in the local area to calculate the direction of each point, ensuring that the feature description vector has the stable property of rotational invariance in the direction. In terms of design parameters, the underflight imaging optical system has a focal length of 46.00 m, a near-infrared spectral channel with a bandpass of 1.2 ~ 1.375 μm, a resolution of 1080 × 2040 high pixels, an F-number of 4, an imaging CCD with a pixel size of 18 μm and an imaging quality that reaches the diffraction limit, and the optical system of each channel has a compact structure. The analysis results show that in this set of high-resolution optoelectronic imaging systems, under different working conditions, the root-mean-square wavefront error of the primary mirror is less than the standard value of 50 nm, and the peak difference is less than the standard value of 200 nm, which meets the high standard requirements of optical imaging.

Keywords

• fpga
• optoelectronic imaging system
• atomic filter
• imaging detector
• diffraction limit
• 00a79