Nature Communications (Nov 2023)

Domain-dependent strain and stacking in two-dimensional van der Waals ferroelectrics

  • Chuqiao Shi,
  • Nannan Mao,
  • Kena Zhang,
  • Tianyi Zhang,
  • Ming-Hui Chiu,
  • Kenna Ashen,
  • Bo Wang,
  • Xiuyu Tang,
  • Galio Guo,
  • Shiming Lei,
  • Longqing Chen,
  • Ye Cao,
  • Xiaofeng Qian,
  • Jing Kong,
  • Yimo Han

DOI
https://doi.org/10.1038/s41467-023-42947-3
Journal volume & issue
Vol. 14, no. 1
pp. 1 – 10

Abstract

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Abstract Van der Waals (vdW) ferroelectrics have attracted significant attention for their potential in next-generation nano-electronics. Two-dimensional (2D) group-IV monochalcogenides have emerged as a promising candidate due to their strong room temperature in-plane polarization down to a monolayer limit. However, their polarization is strongly coupled with the lattice strain and stacking orders, which impact their electronic properties. Here, we utilize four-dimensional scanning transmission electron microscopy (4D-STEM) to simultaneously probe the in-plane strain and out-of-plane stacking in vdW SnSe. Specifically, we observe large lattice strain up to 4% with a gradient across ~50 nm to compensate lattice mismatch at domain walls, mitigating defects initiation. Additionally, we discover the unusual ferroelectric-to-antiferroelectric domain walls stabilized by vdW force and may lead to anisotropic nonlinear optical responses. Our findings provide a comprehensive understanding of in-plane and out-of-plane structures affecting domain properties in vdW SnSe, laying the foundation for domain wall engineering in vdW ferroelectrics.