Processing and Application of Ceramics (Mar 2023)

High-temperature oxidation behaviour of Si3N4 nanowires with different diameters

  • Zhao Shuang,
  • Yang Feiyue,
  • Chen Jun,
  • Li Kunfeng,
  • Fei Zhifang,
  • Yang Zichun

DOI
https://doi.org/10.2298/PAC2301039Z
Journal volume & issue
Vol. 17, no. 1
pp. 39 – 46

Abstract

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α-Si3N4 nanowires with diameters of 100-180 nm (Si3N4-W1) and 420-510 nm (Si3N4-W2) were synthesized by a modified chemical vapour deposition (CVD) method and their microstructure changes after high-temperature oxidation were studied. The results showed that both Si3N4 nanowires were not significantly oxidized when the temperature was lower than 900°C. However, the Si3N4-W1 microstructure began to change significantly after oxidation at 1200°C, while the Si3N4-W2 microstructure remained almost unchanged. Moreover, the Si3N4-W1 and Si3N4-W2 nanowires oxidized significantly after treatment at 1400°C, with weight gain of 26.4% and 13.7%, respectively.

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