Structural and Tribological Aspects on Ti (C,O,N) Magnetron Reactive Sputtered Thin-Films

Abstract

Magnetron sputtering is a flexible technique and allows producing a significant amount of types of coatings. Within the frame of present work, Ti-C-O-N thin films were deposited onto high-speed steel (AISI M2), substrates by reactive dc magnetron sputtering in a laboratory-size deposition system. It consisted of two vertically opposed rectangular magnetrons, in a closed field configuration. The films were prepared using dc power source on a titanium target (99.6 at.%). A gas atmosphere composed of argon (working gas), acetylene and nitrogen/oxygen (17:3) reactive mixture was used for the depositions. In terms of structure, the samples produced only with ethylene and argon flow reveal a TiC structure (NaCl type). The decrease of Ф(C2H2)/Ф(O2+N2) induces amorphisation, but TiC structure, with possible N and O inclusions, is still detected. In terms of tribological aspects, the static friction coefficient and roughness (Rz) were analyzed and discussed depending of composition and structure.

Keywords

• magnetron
• sputtering
• roughness
• friction