ACS Omega
(Jul 2024)
High Volatile Antimony(III) Precursors for Metal Oxide Thin Film Deposition
- Ji-Seoung Jeong,
- Sunyoung Shin,
- Bo Keun Park,
- Seung Uk Son,
- Taek-Mo Chung,
- Ji Yeon Ryu
Affiliations
- Ji-Seoung Jeong
- Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon, Republic of Korea
- Sunyoung Shin
- Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon, Republic of Korea
- Bo Keun Park
- Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon, Republic of Korea
- Seung Uk Son
- Department of Chemistry, Sungkyunkwan University (SKKU), Gyeonggi-do, Republic of Korea
- Taek-Mo Chung
- Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon, Republic of Korea
- Ji Yeon Ryu
- Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon, Republic of Korea
- DOI
-
https://doi.org/10.1021/acsomega.4c03482
- Journal volume & issue
-
Vol. 9,
no. 29
pp.
31871
– 31877
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