Chemical vapour deposition of diamond using low pressure flat combustion flame

Abstract

Diamond coatings were deposited onto Mo and WC-Co substrates using a low pressure premixed acetylene-oxygen flat flame by means of a special apparatus operating at 50 mbar. Uniform diamond coatings containing significant amounts of non-diamond carbon were deposited over areas of »7 cm2 onto Mo substrates, the coating thickness after 1 h deposition amounted to »1 µm. Upon machining an Al-12 % Si alloy under identical conditions, the diamond coated WC-Co cutting tool inserts showed 30 % less wear than the as-received inserts.

Keywords

• low pressure flat flame
• diamond cvd