Structure Design and Numerical Simulation of a High Performance Slit in Soft X-Ray Interference Lithography Beamline at SSRF

Abstract

A high precision slit in ultra-high vacuum is designed to develop a good performance soft X-ray interference lithography (XIL) beamline at Shanghai Synchrotron Radiation Facility (SSRF). In order to define the secondary source and enhance the performance of the beamline, many technical difficulties need resolving to design the precision slit. Therefore, to obtain reasonable design scheme, it is necessary to analyze the structural characteristics, the movement situation, the force state, the thermal load state, and the cooling state of the precision slit deeply by numerical simulation. The simulation results and the testing results demonstrate that the mechanical precision of the slit is at a high level and satisfies the requirements of the beamline.